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山东无尘车间相对湿度控制不好,有什么后果?

来源:http://www.henganjh.cn │ 发表时间:2019-07-10 

  山东无尘车间相对湿度控制不好,可能会降低干净室的整体性能,并带来一系列影响。
  The poor control of relative humidity in Shandong dust-free workshop may reduce the overall performance of the clean room and bring a series of effects.
  1. 细菌生长。细菌和其他生物污染物(霉菌、病毒、真菌、螨虫)在相对湿度超越60%的环境中大量繁衍。当相对湿度超越30%时,一些群落就会生长。相对湿度在40%至60%的范围内,比较大限度地减少了细菌和呼吸道感染的影响。因而,干净室的相对湿度应控制在一定范围内。
  1. Bacterial growth. Bacteria and other biological pollutants (fungi, viruses, fungi, mites) multiply in an environment with relative humidity exceeding 60%. When relative humidity exceeds 30%, some communities grow. Relative humidity ranges from 40% to 60%, minimizing the impact of bacterial and respiratory infections. Therefore, the relative humidity of the clean room should be controlled within a certain range.
  山东无尘车间:http://www.henganjh.cn
  Dust-free workshop in Shandong: http://www.henganjh.cn
  2、干净室工作人员在室温范围内感到温馨。湿度在40%到60%的范围内,对人体温馨度来说也是一个适中的范围。假如干净室内湿渡过高,会感到闷热;假如湿度低于30%,会感到枯燥、皮肤皲裂、呼吸不适感和心情不适感,影响工作。
  2. Clean room staff feel warm in the room temperature range. Humidity in the range of 40% to 60% is also a moderate range for human warmth. If the indoor humidity is too high, it will feel sultry; if the humidity is less than 30%, it will feel dull, chapped skin, breathing discomfort and mood discomfort, affecting work.
  3.干净室相对湿度控制不好,容易产生静电。当相对湿度超越50%时,静电荷开端疾速消散,但当相对湿度小于30%时,静电荷会在绝缘体或未接地外表长期存在。一个令人称心的折衷计划是在干净室中35%到40%的相对湿度之间,半导体干净室通常运用额外的控制来限制静电荷的积聚。
  3. The relative humidity of clean room is not well controlled, and it is easy to generate static electricity. When the relative humidity exceeds 50%, the electrostatic charge begins to dissipate rapidly, but when the relative humidity is less than 30%, the electrostatic charge will exist for a long time on the surface of insulator or ungrounded. A desirable compromise is between 35% and 40% relative humidity in a clean room, where additional controls are usually used to limit the accumulation of electrostatic charges.
山东无尘车间
  山东无尘车间
  Shandong Dustless Workshop
  4. 相对湿度控制差,易形成干净室内金属腐蚀。许多化学反响的速率,包括腐蚀过程,随着相对湿度的增加而增加。一切暴露在干净室四周空气中的外表都很快被至少一层水掩盖。当这些外表由与水反响的薄金属涂层组成时,高湿度加速了反响。一些金属,如铝,与水构成维护氧化物,避免进一步氧化。另一种金属,如氧化铜,则没有维护作用。铜外表在高湿度下更容易腐蚀。
  4. Poor relative humidity control, easy to form clean indoor metal corrosion. The rate of many chemical reactions, including the corrosion process, increases with the increase of relative humidity. Everything exposed to the air around the clean room is quickly covered by at least one layer of water. When these surfaces are made up of thin metal coatings that react with water, high humidity accelerates the response. Some metals, such as aluminium, form maintenance oxides with water to avoid further oxidation. Another metal, such as copper oxide, has no maintenance effect. Copper is more easily corroded in high humidity.
  5. 凝结。在相对湿度较高的干净室环境中,浓水的毛细力在颗粒与外表之间构成键合,增加颗粒与硅质外表之间的粘附力。这种效应称为开尔文浓度,在相对湿度小于50%时并不重要,但当相对湿度在70%左右时,它就成为粒子间粘附的主要力气。
  5. Coagulation. In a clean room with relatively high humidity, the capillary force of concentrated water forms a bond between the particles and the surface, which increases the adhesion between the particles and the surface of silica. This effect, known as Kelvin concentration, is not important when the relative humidity is less than 50%, but when the relative humidity is about 70%, it becomes the main force of particle adhesion.
  6. 干净室光刻质量降落。在半导体干净室中,光刻胶的灵活度是比较迫切需求控制的。由于光刻胶对相对湿度十分敏感,其控制范围对相对湿度的请求比较为严厉。相对湿度和温度对光刻胶的稳定性和尺寸的准确控制至关重要。即便在恒温条件下,光刻胶的粘度也会随着相对湿度的增加而疾速降低。当然,改动粘度,就会改动维护膜的厚度,构成由固定成分组成的涂层。
  6. The quality of lithography in clean room declined. In the semiconductor clean room, the flexibility of photoresist is the most urgent need to be controlled. Because photoresist is very sensitive to relative humidity, its control range is the most stringent request for relative humidity. Relative humidity and temperature are very important to the stability and size control of photoresist. Even at constant temperature, the viscosity of photoresist decreases rapidly with the increase of relative humidity. Of course, if the viscosity is changed, the thickness of the maintenance film will be changed to form a coating consisting of fixed components.
  山东无尘车间
  Shandong Dustless Workshop
  此外,在相对湿度较高的环境中,由于吸水,光刻胶在烘烤后会收缩。较高的相对湿度也会对光刻胶的附着力产生负面影响。低相对湿度(约30%)使光刻胶更容易粘附,以至不需求聚合改性剂,如六甲基二硅烷(HMDS)。
  In addition, photoresist shrinks after baking due to water absorption in relatively humid environment. Higher relative humidity also has a negative impact on the adhesion of photoresist. Low relative humidity (about 30%) makes photoresist easier to adhere, so that polymer modifiers such as hexamethyldisilane (HMDS) are not required.
  7. 水的吸收。相对湿度控制不好,对干净室吸水性有一定影响。
  7. Absorption of water. The relative humidity control is not good, which has a certain effect on the water absorption of clean room.
  以上是山东无尘车间为大家整理的相关内容,想要了解更多内容,欢迎访问网站:http://www.henganjh.cn
  The above is the related content of Shandong Dust-free Workshop. For more information, please visit the website: http://www.henganjh.cn.

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